| 摘要 |
An active matrix liquid crystal display (AMLCD) and method of manufacture includes gate bus lines and gate electrodes formed on a substrate; a gate insulating layer formed on the substrate, the gate bus lines and the gate electrodes; a semiconductor layer formed on the gate insulating layer; and an ohmic contact layer formed on the semiconductor layer. Also source bus lines, source electrodes, drain electrodes and storage electrodes of storage capacitors are formed on the ohmic contact layer. A first passivation layer covers the storage capacitors, the drain electrodes, the semiconductor layer, the source bus lines and source electrodes; and a second passivation layer covers the first passivation layer and the substrate. Contact holes formed in the first and second passivation layers expose the drain electrodes and the storage capacitors. Pixel electrodes are formed on the storage electrodes, the drain electrodes, the passivation layer, and the substrate.
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