| 摘要 |
In a semiconductor device, a gate electrode is formed by sequentially forming a Schottky metal film, a barrier metal film, and a low-resistance metal film from the lower side. The Schottky metal film or barrier metal film has a gap in a lower gate vertical portion. The gap is closed at its upper and lower portions. The overlaying low-resistance metal film does not extend into the lower gate vertical portion. A method for this semiconductor device is also disclosed.
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