| 摘要 |
PURPOSE:To prevent halation and notching on a high-reflective substrate, to stabilize a pattern against prebaking, to enhance resolution, and to restrain deterioration in sensitivity due to addition of a light absorbing agent by incorpo rating a specified compound as the light absorbing agent. CONSTITUTION:The compound to be added as th light absorbing agent is represented by formula I in which each of R1 - R3 is independently H, optionally substituted alkyl, or halogen; each of X and Y is independently cyano, -COOR, or CONHR'; R is alkyl; and R' is H or aryl. It is preferred to use the resist composition containing this compound as the positive type resist composition and the composition comprising a novolak resin obtained by polycondensing some of phenols with formaldehyde, and 1,2-quinonediazido compound, thus permitting halation and notching on the high-reflective substrate to be prevented, a pattern to be stabilized against prebaking, resolution to be enhanced, and deterioration of sensitivity due to addition of the agent to be restrained. |
