发明名称 PROCESS FOR PRODUCING NANOSTRUCTURED METAL OXIDE THIN FILMS ON SUBSTRATES, SUBSTRATES AND FILMS THEREOF
摘要 <p>A process for producing at least one epitaxial, nanostructured thin film (4) of metal oxide and/or a hydrated metal oxide on at least one substrate (3) placed in a container (1) and a substrate/thin film thereof, said process comprising placing said substrate (3) at any location in said container (1) containing a water solution (2), such that a covering area of said substrate (3) being covered by said solution (2), containing at least one metal salt and additionally can contain other salts, pH-regulator(s), complexant(s), or molecules, whereby from said substrate (3) particles of a metal oxide of the metal from said metal salt is grown, forming said film (4) on said covering area of said substrate (3).</p>
申请公布号 WO1999035312(A1) 申请公布日期 1999.07.15
申请号 SE1999000014 申请日期 1999.01.08
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