发明名称 BEAM DIVERTING SHUTTER FOR LASER BEAM
摘要 <p>The shutter mechanism has a slide element coupled to a support base by a number of roller bearings journalled between opposing pairs of guide rods. The slide element and support base have corresponding beam apertures in alignment when the shutter is in its open position. Angularly mounted on the slide, adjacent to the slide's beam aperture, is a UV reflective mirror. When the shutter is commended to close, an actuator forces the slide and support base apertures out of alignment, while simultaneously positioning the UV reflective mirror into the position previously occupied by the slide's aperture. A laser beam, previously being transmitted through the aligned apertures, will be reflected by the mirror to a beam stop as a diagnostic instrument mounted on the support base.</p>
申请公布号 KR100210506(B1) 申请公布日期 1999.07.15
申请号 KR19960036294 申请日期 1996.08.29
申请人 CYMER LASER TECHNOLOGIES 发明人 DE RUYTER, ANTHONY J.;MEANS, DAVID W.
分类号 G02B26/08;B23K26/42;G02B26/04;H01S3/00;H01S3/101;(IPC1-7):H01S3/10 主分类号 G02B26/08
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