发明名称 PATTERNING MASK FOR MICRO-LENS
摘要 A mask for patterning a microlens includes a glass substrate, a main light-blocking region formed on a predetermined area of the glass substrate, and auxiliary light-blocking regions formed around the main light-blocking region or on a part of the main light-blocking region such that as the intervals between the main and auxiliary light-blocking regions become longer, the intensity of light transmitted thereto becomes greater.
申请公布号 KR100209752(B1) 申请公布日期 1999.07.15
申请号 KR19960016465 申请日期 1996.05.16
申请人 HYUNDAI MICRO ELECTRONICS CO.,LTD. 发明人 BAIK, EUI-HYUN
分类号 G02B3/00;G03F1/00;G03F1/68;G03F7/20;H01L27/14;H01L27/146;H01L31/02 主分类号 G02B3/00
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