发明名称 |
PATTERNING MASK FOR MICRO-LENS |
摘要 |
A mask for patterning a microlens includes a glass substrate, a main light-blocking region formed on a predetermined area of the glass substrate, and auxiliary light-blocking regions formed around the main light-blocking region or on a part of the main light-blocking region such that as the intervals between the main and auxiliary light-blocking regions become longer, the intensity of light transmitted thereto becomes greater. |
申请公布号 |
KR100209752(B1) |
申请公布日期 |
1999.07.15 |
申请号 |
KR19960016465 |
申请日期 |
1996.05.16 |
申请人 |
HYUNDAI MICRO ELECTRONICS CO.,LTD. |
发明人 |
BAIK, EUI-HYUN |
分类号 |
G02B3/00;G03F1/00;G03F1/68;G03F7/20;H01L27/14;H01L27/146;H01L31/02 |
主分类号 |
G02B3/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|