发明名称 Halbleiterspeicheranordnung und Verfahren zu deren Herstellung
摘要 The invention relates to a semiconductor memory system comprising a semiconductor body (1) in which memory cells (SZ1, SZ2) are configured which each have a selection transistor (T2) and memory means (CG, CGS, CGD) for memorising an electrical charge. The semiconductor body (1) has columns, the lateral surfaces (4, 6) of which extend at least approximately in a vertical manner. Each memory cell (SZ1, SZ2, SZ3) is embodied on a lateral surface (4; 6) of one of the columns (2).
申请公布号 DE19800340(A1) 申请公布日期 1999.07.15
申请号 DE19981000340 申请日期 1998.01.07
申请人 SIEMENS AG, 80333 MUENCHEN, DE 发明人 KRAUTSCHNEIDER, WOLFGANG, DIPL.-ING. DR., 83104 TUNTENHAUSEN, DE;HOFMANN, FRANZ, DR.RER.NAT., 80995 MUENCHEN, DE;SCHLOESSER, TILL, DR.RER.NAT., 80339 MUENCHEN, DE
分类号 H01L21/8242;H01L27/108;(IPC1-7):H01L27/108;H01L21/824;G11C11/401 主分类号 H01L21/8242
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