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发明名称
PHOTORESIST FOR DEEP UV AND METHOD FOR FORMING A FINE PATTERN
摘要
申请公布号
KR100209371(B1)
申请公布日期
1999.07.15
申请号
KR19960034194
申请日期
1996.08.19
申请人
HYUNDAI ELECTRONICS IND. CO.,LTD
发明人
KO, CHA-WON;CHUNG, JAE-CHANG;BOK, CHUL-KYU;HONG, JUNG-EUN
分类号
G03F7/032;G03F7/039;(IPC1-7):G03F7/039
主分类号
G03F7/032
代理机构
代理人
主权项
地址
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