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发明名称
PROCESS FOR FORMING INTERCONNECTION IN SEMICONDUCTOR DEVICE
摘要
申请公布号
KR100207521(B1)
申请公布日期
1999.07.15
申请号
KR19960053825
申请日期
1996.11.13
申请人
SAMSUNG ELECTRONICS CO, LTD.
发明人
PARK, JI-SOON;LEE, JANG-EUN;KIM, KWANG-BOK;KIM, BYUNG-JUN
分类号
H01L21/28;H01L21/3205;(IPC1-7):H01L21/320
主分类号
H01L21/28
代理机构
代理人
主权项
地址
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