POLISHING PAD CONDITIONER IN CMP EQUIPMENT,申请号KR19960050503-传众专利搜索

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发明名称	POLISHING PAD CONDITIONER IN CMP EQUIPMENT
摘要
申请公布号	KR100207514(B1)	申请公布日期	1999.07.15
申请号	KR19960050503	申请日期	1996.10.30
申请人	SAMSUNG ELECTRONICS CO, LTD.	发明人	PARK, KYE-SUN;PARK, YOUNG-RAE
分类号	H01L21/304;(IPC1-7):H01L21/304	主分类号	H01L21/304
代理机构		代理人
主权项
地址

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