Method and apparatus for etching a semiconductor article and method of preparinga semiconductor article by using the same,申请号AU19980098186-传众专利搜索

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发明名称	Method and apparatus for etching a semiconductor article and method of preparinga semiconductor article by using the same
摘要
申请公布号	AU9818698(A)	申请公布日期	1999.07.15
申请号	AU19980098186	申请日期	1998.12.24
申请人	CANON KABUSHIKI KAISHA	发明人	NOBUHIKO SATO
分类号	H01L21/20;H01L21/306;H01L21/762	主分类号	H01L21/20
代理机构		代理人
主权项
地址

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