发明名称 |
METHOD AND DEVICE FOR TREATING SUBSTRATES |
摘要 |
The invention relates to a method for treating substrates in a container with at least one fluid and ultrasound. The opposite walls of the container have at least two ultrasound radiation areas. A particularly good, homogeneous and intensive ultrasound treatment of the substrates is achieved due to the fact that the ultrasound radiation areas can be individually controlled. |
申请公布号 |
WO9935672(A1) |
申请公布日期 |
1999.07.15 |
申请号 |
WO1998EP07405 |
申请日期 |
1998.11.18 |
申请人 |
STEAG MICROTECH GMBH;OSHINOWO, JOHN |
发明人 |
OSHINOWO, JOHN |
分类号 |
H01L21/304;B01J19/10;B08B3/12;H01L21/00 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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