| 发明名称 |
Metal patterning by formation of etchable plural metal compositions |
| 摘要 |
<p>Patterned difficult-to-etch metal structures are formed by converting a difficult-to-etch metal to an etchable plural metal composition in regions where the difficult-to-etch metal is to be removed. <IMAGE></p> |
| 申请公布号 |
EP0929096(A2) |
申请公布日期 |
1999.07.14 |
| 申请号 |
EP19980310216 |
申请日期 |
1998.12.14 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BRONNER, GARY B.;GAMBINO, JEFFREY P.;KOTECKI, DAVID E. |
| 分类号 |
H01L21/28;H01L21/306;H01L21/768;H01L21/8242;H01L21/8246;H01L21/8247;H01L27/10;H01L27/105;H01L27/108;H01L29/788;H01L29/792;(IPC1-7):H01L21/320;H01L21/321 |
主分类号 |
H01L21/28 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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