| 摘要 |
PROBLEM TO BE SOLVED: To provide a device that can inspect a photo mask without extending in particular required time and detect defects on the photo mask with high accuracy and reliability, even if a micromachined photo mask is inspected. SOLUTION: This device detects defects on a photo mask by comparing the design data and the optical image data obtained from the photo mask. In order to obtain the optical image of the mask pattern on the photo mask, a plurality of optical means 111 and 112 are provided so that one photo mask can be inspected by a plurality of optical means at the same time. Detected defects are processed through AND processing or OR processing, as required. |
