| 摘要 |
A nitrogenated evaporable getter device with high fritting resistance, comprising an open metal container wherein there is a mixture of: BaAl4, in form of powders having particle size smaller than 250 mu m; nickel, in form of powders having, at least for 80% by weight, a particle size ranging from 10 to 60 mu m, the rest consisting of powders having a particle size smaller than 10 mu m; and a third component, in form of powders having a particle size smaller than 125 mu m, consisting of discrete particles comprising grains of a nitrogenated compound selected among iron nitride (Fe4N), germanium nitride (Ge3N4) or mixed nitrides of iron and germanium, said grains being coated by a thin vitreous layer of a mixed oxide comprising boron oxide (B2O3) and silicon oxide (SiO2), formed through a sol-gel process employing a starting solution wherein the atomic ratio between boron and silicon ranges about from 0.75:1 to 4:1. |
