发明名称 |
NOR-type mask ROM having dual sense current paths |
摘要 |
A NOR-type mask ROM reduces the resistance ratio of buried diffusion layers and improves the drive capacity of bank selection transistors by utilizing sub-bit line selection transistors located near the center of a memory cell array. The sub-bit line selection transistors are connected to a pair of sub-bank selection lines that divide the memory cell array into symmetric upper and lower portions. The bank selection transistors couple alternate sub-bit lines to main bit lines at both ends of the sub-bit lines, thereby forming a dual current path between the main bit lines and the memory cells coupled to the sub-bit lines.
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申请公布号 |
US5923606(A) |
申请公布日期 |
1999.07.13 |
申请号 |
US19970954905 |
申请日期 |
1997.10.21 |
申请人 |
SAMSUNG ELECTRONICS, CO., LTD. |
发明人 |
LEE, WOON-KYUNG;KIM, EUI-DO |
分类号 |
H01L21/8246;H01L27/112;(IPC1-7):G11C13/00 |
主分类号 |
H01L21/8246 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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