发明名称 NOR-type mask ROM having dual sense current paths
摘要 A NOR-type mask ROM reduces the resistance ratio of buried diffusion layers and improves the drive capacity of bank selection transistors by utilizing sub-bit line selection transistors located near the center of a memory cell array. The sub-bit line selection transistors are connected to a pair of sub-bank selection lines that divide the memory cell array into symmetric upper and lower portions. The bank selection transistors couple alternate sub-bit lines to main bit lines at both ends of the sub-bit lines, thereby forming a dual current path between the main bit lines and the memory cells coupled to the sub-bit lines.
申请公布号 US5923606(A) 申请公布日期 1999.07.13
申请号 US19970954905 申请日期 1997.10.21
申请人 SAMSUNG ELECTRONICS, CO., LTD. 发明人 LEE, WOON-KYUNG;KIM, EUI-DO
分类号 H01L21/8246;H01L27/112;(IPC1-7):G11C13/00 主分类号 H01L21/8246
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