TRANSPARENT ELECTRODE SUBSTRATE, ITS PREPARATION AND PRODUCTION OF PHOTOELECTROMOTIVE FORCE ELEMENT

摘要

PROBLEM TO BE SOLVED: To prepare a transparent electrode substrate having a good textural structure on the surface thereof even when the thickness of a transparent electroconductive film is reduced or under relatively low-temperature conditions. SOLUTION: (a) A crystalline film 2 of a microcrystalline silicon alloy is formed on a light transmitting substrate 1 made of a glass according to a plasma chemical vapor deposition(CVD) method. (b) A transparent electroconductive film 3 consisting essentially of any of tin oxide, zinc oxide and indium oxide is laminated and formed on the crystalline film 2 according to a thermal CVD method to prepare a transparent electrode substrate 4 having a textural structure on the surface thereof.