发明名称 DIRECT ELECTRON BEAN LITHOGRAPHIC METHOD AND DEVICE AND STORAGE MEDIUM THEREOF
摘要 PROBLEM TO BE SOLVED: To prevent defective pattern connections by dividing a plurality of drawing data into fields. SOLUTION: Drawing data 11 is converted into a recognizable format for it to be transferred to a memory 13. A program stored in a storage medium 16 is executed in the drawing control unit 15 to divide the data into a plurality of fields using the input chip size 3. The coordinates are stored in the memory 13. The drawing data 1 and 2 are read sequentially and divided, based on the chip field coordinates. Each divided drawing data is directly drawn on a sample of a device body 14 by the S&R method. Since the data is not affected much by deflection, drawing defects such as disconnection of different patterns is prevented from occurring.
申请公布号 JPH11191527(A) 申请公布日期 1999.07.13
申请号 JP19970360073 申请日期 1997.12.26
申请人 NEC CORP 发明人 ONODA ATARU
分类号 G03F7/20;H01J37/302;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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