发明名称 METHOD FOR POLISHING LANTHANUM ALUMINATE SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To machine a surface to be flat with excellent surface roughness by using colloidal alumina or colloidal cerium as the abrasive. SOLUTION: Oscar type or lap master type single-side polishing machine or a four-way type double-sided polishing machine are used for a polishing device of a polishing method of a LaAlO3(lanthanum aluminate). The abrasive includes colloidal alumina or colloidal cerium in which fine particles of alumina or cerium of 7-300 nm in colloid size are stably diffused without sedimentation. In a manufacturing method of the colloidal metal oxide, the mainly excessive negative ion is first removed from dilute aqueous solution of metallic salt, fine hydroxide of the metallic ion in the solution is condensed and partly dehydration-polymerized to form particles. The colloidal metal oxide of the desired grain size and shape can be generated by controlling the pH, concentration, temperature, processing time of the solution.
申请公布号 JPH11188609(A) 申请公布日期 1999.07.13
申请号 JP19970357074 申请日期 1997.12.25
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 NISHIHARA KAZUNARI;SHIMAMURA TETSUO
分类号 B24B37/00 主分类号 B24B37/00
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