发明名称 |
Fluorometric method for increasing the efficiency of the rinsing and water recovery process in the manufacture of semiconductor chips |
摘要 |
A method for determining wafer cleanliness by fluorometric monitoring of the impurities in the semiconductor chip wafer rinse solution. A clean chip is indicated by a leveling off of increased concentration of impurities as the rinsing of the chip progresses. A method for optimizing reuse or recyling of the water discharged from the rinse process which accurately measures the contaminants in that water.
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申请公布号 |
US5922606(A) |
申请公布日期 |
1999.07.13 |
申请号 |
US19970931556 |
申请日期 |
1997.09.16 |
申请人 |
NALCO CHEMICAL COMPANY |
发明人 |
JENKINS, BRIAN V.;HOOTS, JOHN E. |
分类号 |
H01L21/304;H01L21/306;(IPC1-7):G01N21/64 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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