| 摘要 |
<p>PROBLEM TO BE SOLVED: To improve positioning resolution, and at the same time to reduce manufacture costs by rotating a wafer retention platform that can be independently connected to two clamps with a rotary shaft while each clamp is independent of a plurality of X and Y positions. SOLUTION: A structure body 51 of a wafer positioning system supports two clamps 52 and 53, each clamp can be independently connected to a wafer retention platform 54. The clamp is fixed to and is released from a shaft by an electromagnet. Motors 61 and 62 separately supply rotary force to each of shafts 55 and 56 and allow each of the clamps 52 and 53 to be rotated. The supply of the rotary force is controlled by clamp controller 61A and 62A. Due to rotation, the wafer retention platform 54 advances in parallel on a plane being determined by the surface of the clamps 52 and 53, and the amount of rotation is determined by the travel amount of X and Y being required between an original position and a final one.</p> |
