发明名称 Method for the manufacture of ornamental silicon articles
摘要 PCT No. PCT/JP94/01265 Sec. 371 Date Jan. 22, 1997 Sec. 102(e) Date Jan. 22, 1997 PCT Filed Aug. 1, 1994 PCT Pub. No. WO96/04412 PCT Pub. Date Feb. 15, 1996The mirror-finished silicon surface is brought for pre-processing into contact with the hydrofluoric acid solution, it is NH cleansed, and then it is filmed by oxidation. Otherwise, the silicon surface not mirror-finished is brought for pre-processing into contact with the hydrofluoric acid solution, it is subject to an alkali etching {by a solution of KOH:H2O base, NaOH:H2O base, NH4OH:H2O base, or [NH2(CH2)2NH2]:H2O:[C6H4(OH)2]base}, it is NH cleansed by the solution of (NH4OH:H2O2 base or NH4OH:H2O2:H2O base), and then it is filmed by oxidation. In such manufacturing methods the ornamental silicon articles may be processed to their final shape thereafter effecting an oxidation filming. Thus, without using a coloring agent the silicon surface is colored to provide ornamental silicon articles having excellent ornamental properties.
申请公布号 US5922213(A) 申请公布日期 1999.07.13
申请号 US19970750946 申请日期 1997.01.22
申请人 KOMATSU ELECTRONIC METALS CO., LTD. 发明人 KUMAGAI, HIDEO;FUJINUKI, KENZO;IMAI, ITARU
分类号 B44C1/00;C04B41/45;C30B33/00;(IPC1-7):C30B29/06;C30B33/02;C04B41/00 主分类号 B44C1/00
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