| 摘要 |
PURPOSE:To make it possible to perform nondestructive elementary analysis for the outermost surface layer of the material to be analyzed. CONSTITUTION:A particle beam is applied on a sample to be analyzed 11. The element of the sample to be analyzed 11 is analyzed by utilizing the characteristic X rays emitted from the sample to be analyzed 11. In this elementary analysis method, the positron beam, which is generated by a positron beam generator 20, is used as the particle beam. The positron beam is applied on the sample to be analyzed 11 through a lens 12 and a scanning coil 13. Then, the incident positron on the sample to be analyzed 11 undergoes pair annihilation together with electron in the atoms in the sample to be analyzed 11. Thus, the atoms in the sample to be analyzed 11 are made to be the excited state, and the characteristic X rays are generated. |
