| 摘要 |
PROBLEM TO BE SOLVED: To support a substrate without interfering with apparatus operating near the substrate surface by providing a second substrate holder having a lifting mechanism during rotating, and making so that first and second substrate holders do not project up wards from the substrate surface for holding the substrate. SOLUTION: An apparatus has a rotary base 300 for rotating a substrate, a first substrate holders 400 for supporting the substrate W horizontally at the bottom face above the base 300 without projecting up from the top face of the substrate W, and a second substrate holder 500 which is liftably disposed on the base 300, waits at a position not projecting up from the substrate top face supported with the first holders 400 when lowered, and contacts the periphery of the substrate W supported with the first holders 400 to regulate the horizontal moving of the wafer W, when lifted. |
