| 摘要 |
PROBLEM TO BE SOLVED: To easily and directly measure the influence of an aberration component accompanied with the deviation in a pattern transfer position with high accuracy. SOLUTION: Basic periodic patterns 42 and double periodic patterns 43 are arranged in proximate positions. In addition, a plurality of pattern blocks 4 in which the period directions of these periodic patterns 42, 43 face the same direction are disposed and are so arranged that the period directions of the plural pattern blocks 41 respectively intersect with each other. When the numerical aperture of a projection optical system is defined as NA, an exposure wavelength as λ1 and the inverse number of the reduction ratio of the projection optical system as M(>1), the period P of the basic periodic patterns is given by λ/NA<P/M<1.5×λ/NA. |
