| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacture of an x-ray mask that enables measurement of the stress of the x-ray absorptive film without measuring the warpage of the substrate. SOLUTION: A membrane film 22 is formed on the surface of a substrate 21 and a frame 23 is bonded on the backside of the substrate 21. The part of the substrate 21 that is exposed inside the frame 23 is removed to expose the membrane film 22. The natural frequency is obtained by vibrating the membrane film 22. After an x-ray absorptive film 24 is formed on the membrane film 22, the natural frequency is obtained again by vibrating the membrane film 22. The stress of the x-ray absorptive film 24 is obtained from the natural frequency values of the membrane film 22 before and after the x-ray absorptive film 24 is formed. Annealing is done to obtain generally zero stress of the x-ray absorptive film 24. Then, the x-ray absorptive film 24 is patterned into a required pattern. |
