| 摘要 |
PROBLEM TO BE SOLVED: To prevent occurrence of peeling of an amorphous film by a method, wherein there are formed a transparent conductive film formed on a base body and a photoconductive film having an amorphous material on the transparent conductive film, and the transparent conductive film has specified values of film thickness and surface roughness. SOLUTION: A transparent base body 2 is formed with an insulator such as glass, acryl or the like, and an amorphous film 6 is deposited. A transparent conductive film 3 of the amorphous film 6 is formed on the transparent base body 2, to constitute an electrode for an inflow and outflow of carriers from the amorphous film 6. A photoconductive film 4 contains an amorphous material, of which a parent body is a silicon and contains at least one atoms out of hydrogen atoms and halogen atoms. A surface protective film 5 protects the photoconductive film 4 from an external force, an oxidation, humidity, or the like. The film thickness of the transparent conductive film 3 is approximately 300 to 3,000 angstroms, and surface roughness is approximately 0.8 micron or less in the constitution. |
