| 摘要 |
<p>PROBLEM TO BE SOLVED: To specify the cause of the error of an image forming characteristic in a projection exposure system. SOLUTION: The line width of a plurality of resist patterns 50i and 50j formed on a shot area SA on a wafer with exposure and development is measured by the scanning exposure system. The average value of the line width of the resist patterns arranged in parallel to a scanning direction (Y direction) and the average value of the line width of the resist patterns arranged along a non-scanning direction (X direction) are found. When the line width of the same type of patterns formed along the non-scanning direction shows dispersion, the error is considered to occur by a projection optical system. When the patterns formed along the scanning direction show a prescribed trend, an exposure quantity error, a focus error or a synchronous error are considered to occur.</p> |
