发明名称 LASER EXPOSURE DEVICE
摘要 PROBLEM TO BE SOLVED: To prevent resonance of an exposure optical system due to cooling water vibration and to improve precision of an optical axial positioning, exposure positioning mechanism by fitting a water cooling laser light source and an exposure optical system to respectively different surface plates. SOLUTION: A first surface plate 1a and a second surface plate 1b are laminated through a support member 26, and vibration-absorbing mechanisms 24, 25 are provided between the first surface plate 1a and the support member 26 and between the second surface plate 1b and the support member 26, and the vibration on the first surface plate 1a and the vibration etc., from a floor on which this device is arranged are prevented from propagating to the second surface plate 1b on which the exposure optical system is provided. Further, a temp. controlling cooling water circulation pipe is connected to the first surface plate 1a, and a laser light source 2 oscillating laser light in an ultraviolet region is provided on the first surface plate 1a, and the emitted laser light is led to the second surface plate 1b through an optical fiber 15. This laser light is made incident on a noise reducer 4 through a collimate lens 22, and further, is made incident on an optical modulator 6 to be led to a rotating optical disk master disk 13.
申请公布号 JPH11185304(A) 申请公布日期 1999.07.09
申请号 JP19970354934 申请日期 1997.12.24
申请人 SONY CORP 发明人 YAMATSU HISAYUKI;AKI YUICHI
分类号 G03F7/20;G11B7/125;G11B7/26 主分类号 G03F7/20
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