| 摘要 |
PROBLEM TO BE SOLVED: To provide a load locking mechanism, wherein the winding of particles is not generated, when a gate valve between a load locking chamber and the side of atmosphere is opened, a substrate processing device using the mechanism thereof, and the substrate processing method. SOLUTION: A load locking mechanism is provided between an atmospheric- side part 16 and a vacuum-state part 4. Load locking chambers 12 and 13 can be held under a vacuum state or under an atmospheric state. First main opening/ closing mechanisms 10 and 11 open and close the part between the load locking chambers 12 and 13 and the vacuum-state part 4. Second main opening/closing mechanisms 14 and 15 open and close the part between the load locking parts 12 and 13 and the atmospheric-side part 16. An opening/closing valve 35 is provided between the load locking parts 12 and 13 and the atmospheric-side part 16 and is sufficiently smaller than the second main opening/closing mechanism. When the load-locking chambers 12 and 13 become approximately atmospheric state as the load-locking chambers 12 and 13 became the atmospheric state from the vacuum state, the opening/closing valve 35 is opened. Thereafter, the second main opening/closing mechanisms 14 and 15 are opened. |
