EXPOSURE APPARATUS, METHOD OF PRODUCING THE APPARATUS, AND EXPOSURE METHOD, AND DEVICE AND METHOD OF MANUFACTURING THE DEVICE

摘要

An exposure apparatus comprising an electron beam barrel (16) movable parallel with a wafer (W) for exposing a two-dimensional region (XY two-dimensional region) of the wafer to an electron beam (EB). The exposure can be done by moving the electron beam barrel (16) XY-two-dimensionally even if a wafer holder (WST) is fixed. Therefore, the footprint of the exposure apparatus is reduced to about 1/4 compared to conventional apparatuses in which the electron beam barrel (16) is fixed and the wafer holder (WST) is two-dimensionally movable.