发明名称 MAGNETIC BODY SPUTTERING TARGET
摘要 <p>A magnetic body magnetron sputtering target, especially a ferromagnetic body sputtering target having an improved efficiency of use and a long life. The target is shaped into a plate. On both sides of the region which is most liable to be eroded when magnetron sputtering is performed, one or more grooves are formed parallel with the region, and the region is divided into parts so that the erosion progresses parallel with the grooves.</p>
申请公布号 WO1999034029(P1) 申请公布日期 1999.07.08
申请号 JP1998005898 申请日期 1998.12.25
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