发明名称 PHOTOCATALYTIC COMPOSITION
摘要 <p>The present invention is directed to a photocatalytic composition which comprises at least one compound selected from a group consisting of polycyclic aromatic compounds and carbazole derivatives, both of which contain as substitutes at least any of hydroxy group, optionally-substituted aralkyloxy group or alkoxy group and having an UV absorption spectrum at a wavelength longer than 330 nm, and at least one aryl onium salt selected from a group consisting of diphenylalkylsulfonium salts, dinaphthylalkylsulfonium salts, triphenylsulfonium salts, diphenyliodonium salts, phenylnaphthyliodonium salts and dinaphthyliodonium salts, those which perform as a catalyst for cationic photopolymerization. The photocatalytic composition according to the present invention can be cured by admixing it with a cationically-polymerizable compound in the presence of an actinic radiation, such as light, electron beam and X-ray. Furthermore, as the photocatalytic composition can be cured under light of which wavelength is longer than 330 nm, where triphenylsulfonium salts and diphenyliodonium salts have either no or very little absorption spectrum, curing speed of the clear composition tend to be remarkably accelerated, while the photocuring of the composition containing an additive such as a pigment can be achieved effectively. Therefore, the photocatalytic composition of the present invention is suitably applicable to photocurable coating materials, adhesives, inks and photoresist, photosensitive resins for stereolithography, and so on.</p>
申请公布号 EP0927726(A1) 申请公布日期 1999.07.07
申请号 EP19970941186 申请日期 1997.09.18
申请人 NIPPON SODA CO., LTD. 发明人 TAKAHASHI, EIJI
分类号 C08F2/50;C08F4/00;C08G59/68;C08G65/10;C08G65/18;G03F7/004;G03F7/038;(IPC1-7):C08F4/00;C08F16/18 主分类号 C08F2/50
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