发明名称 |
SUBSTRATE TREATMENT APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus capable of immediately executing pure water cleaning right after the stop of a medicinal liquid treatment and decreasing the volume of waste medicinal liquids. SOLUTION: This apparatus includes a first vessel 4 for executing the first treatment of a substrate 1 and a second vessel 5 for executing the second treatment of the substrate 1 and is provided with an aperture 13 and a substrate vertical driving means 10 to allow the substrate 1 to move between these vessels 4 and 5. The first vessel 4 is provided with a first discharge port 8 and the second vessel 5 with a second discharge port 9 in order to separately recover the waste liquids generated in the first and second treatments. |
申请公布号 |
JPH11181584(A) |
申请公布日期 |
1999.07.06 |
申请号 |
JP19970349371 |
申请日期 |
1997.12.18 |
申请人 |
TOSHIBA ELECTRONIC ENGINEERING CORP;TOSHIBA CORP |
发明人 |
HIGASHIJIMA TAKUO;KASHII KENICHI |
分类号 |
G03F7/30;B05C11/08;C23F1/08;C23G3/00;H01L21/027;H01L21/304;H01L21/306;(IPC1-7):C23F1/08 |
主分类号 |
G03F7/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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