发明名称 |
Method for making multilayer resist structures with thermosetting anti-reflective coatings |
摘要 |
A method for making multilayer resist structures for microlithographic processing using a thermosetting anti-reflective coating is disclosed for a broad range of exposure wavelengths, said coating containing an active curing catalyst, ether or ester linkages derived from epoxy functionality greater than 3.0, a dye-grafted hydroxyl-functional oligomer, and an alkylated aminoplast crosslinking agent, all present in a low-to-medium alcohol-containing solvent.
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申请公布号 |
US5919598(A) |
申请公布日期 |
1999.07.06 |
申请号 |
US19960692714 |
申请日期 |
1996.08.06 |
申请人 |
BREWER SCIENCE, INC. |
发明人 |
FLAIM, TONY D.;MEADOR, JIM D.;SHAO, XIE;BREWER, TERRY LOWELL |
分类号 |
C08G59/14;C08G59/16;C08G59/40;C08G59/68;C08L63/00;C09D163/00;G03F7/09;(IPC1-7):G03C1/795;G03C1/835;C08L59/00;C08L5/04 |
主分类号 |
C08G59/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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