发明名称 |
PROCEDE POUR LE TRANSFERT D'UN FILM MINCE COMPORTANT UNE ETAPE DE CREATION D'INCLUSIONS |
摘要 |
The invention concerns a method for transferring at least a thin film of solid material delimited in an initial substrate (20) comprising the following steps: a step for forming a layer of inclusions (21) in the initial substrate (20), at a depth corresponding to the thickness required for the thin film, said inclusions being provided to constitute traps for the gas species to be subsequently implanted; a subsequent step for implanting said gas species so as to bring the gas species into the layer of inclusions (21), the dose of implanted gas species implanted being sufficient to bring about the formation of microcavities capable of constituting a fracture plane enabling the thin film to be separated from the rest of the substrate.
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申请公布号 |
FR2773261(A1) |
申请公布日期 |
1999.07.02 |
申请号 |
FR19970016696 |
申请日期 |
1997.12.30 |
申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE |
发明人 |
MORICEAU HUBERT;BRUEL MICHEL;ASPAR BERNARD;MALEVILLE CHRISTOPHE |
分类号 |
H01L21/02;H01L21/265;H01L21/762;H01L27/12;(IPC1-7):H01L21/265;H01L21/324 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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