SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE,申请号JP19970344760-传众专利搜索

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发明名称	SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要
申请公布号	JPH11176982(A)	申请公布日期	1999.07.02
申请号	JP19970344760	申请日期	1997.12.15
申请人	APIC YAMADA CORP	发明人	MORIMURA MASAHIRO
分类号	H01L23/28;H01L23/12;(IPC1-7):H01L23/12	主分类号	H01L23/28
代理机构		代理人
主权项
地址

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