发明名称 METHOD AND INSTALLATION FOR REFINING SILICON
摘要 The invention concerns a method for refining silicon, consisting in filling a cold induction crucible (1) with solid silicon; liquefying the crucible content; carrying out, using the induction crucible, a turbulent mixing of the silicon bath (b) by bringing up the liquid from the bottom of the crucible towards the free surface along the crucible central axis; directing a plasma (f) generated by an induction plasma torch (2) towards the bath surface for a time interval enabling the elimination of impurities for which the plasma reactive gas (gr) is adapted.
申请公布号 WO9932402(A1) 申请公布日期 1999.07.01
申请号 WO1998FR02765 申请日期 1998.12.17
申请人 CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE;GARNIER, MARCEL;TRASSY, CHRISTIAN 发明人 GARNIER, MARCEL;TRASSY, CHRISTIAN
分类号 C01B33/037;H01L31/04 主分类号 C01B33/037
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