发明名称 METHOD AND INSTALLATION FOR REFINING SILICON
摘要 <p>The invention concerns a method for refining silicon, consisting in filling a cold induction crucible (1) with solid silicon; liquefying the crucible content; carrying out, using the induction crucible, a turbulent mixing of the silicon bath (b) by bringing up the liquid from the bottom of the crucible towards the free surface along the crucible central axis; directing a plasma (f) generated by an induction plasma torch (2) towards the bath surface for a time interval enabling the elimination of impurities for which the plasma reactive gas (gr) is adapted.</p>
申请公布号 WO1999032402(A1) 申请公布日期 1999.07.01
申请号 FR1998002765 申请日期 1998.12.17
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