Press-forming die for glass elements

摘要

A platinum thin film (16) having a thickness of 0.01 to 5 mu m is formed, e.g. by means of the sputtering method, on an outermost surface of a press face (12) of a die (10) based on the use of a cemented carbide base material. Optionally, a nickel thin film having a thickness of 0.05 to 0.5 mu m or a thin film made of an alloy of platinum and iridium may intervene between the cemented carbide base material and the platinum thin film (16): alternatively, an alloy thin film having a thickness of 0.01 to 5 mu m, which contains 10 to 70% by weight of iridium and 30 to 90% by weight of one or more species of metals selected from metals of the platinum group except for iridium, may intervene between the cemented carbide base material and the platinum thin film (16). The die is suitable for use in pressing glass elements for optical IC, e.g. lenses, V-shaped grooved elements for fixing glass optical fibres.