发明名称 METHOD AND DEVICE FOR WASTE GAS TREATMENT
摘要 <p>PROBLEM TO BE SOLVED: To make the used quantity of ammonia smaller than ever to increase treating efficiency. SOLUTION: A waste gas treating device for treating NOx and SOx containing waste gas by plasma is provided with a reaction vessel 11, a plasma generating means consisting of a cylindrical central electrode 12 arranged on the central axis part in the reaction vessel 11, a gaseous ammonia feeding pipe 13 connected to the upstream side edge of the central electrode 12, a gaseous nitrogen bring- out pipe 15 arranged near the upstream side inlet of the central electrode 12 so as to cover the outside of the central electrode 12, and a gaseous nitrogen introducing pipe 16 connected to the gaseous nitrogen bring-out pipe 15. While gaseous nitrogen of the volume corresponding to a mole ratio equal to two times of that of NO contained in the waste gas on the upstream side of the waste gas is fed, plasma is generated, and on the downstream side of the waste gas, gaseous ammonia of the volume corresponding to a mole ratio two times to 1.4 times of that of SO2 on the downstream side of the waste gas is fed to treat the waste gas.</p>
申请公布号 JPH11169660(A) 申请公布日期 1999.06.29
申请号 JP19970347858 申请日期 1997.12.17
申请人 MITSUBISHI HEAVY IND LTD 发明人 NISHIDA SEIICHI;KAWAMURA KEISUKE
分类号 B01D53/34;B01D53/32;B01D53/60;B01D53/74;(IPC1-7):B01D53/60 主分类号 B01D53/34
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