发明名称 POLISHING DEVICE
摘要 PROBLEM TO BE SOLVED: To easily keep the flatness of an abrasive cloth by providing, on a conditioning equipment, a mechanism moved on the surface of the abrasive cloth on the basis of the measurement result of an unevenness measuring instrument to flatten the surface. SOLUTION: When an unevenness measuring instrument is moved on a transfer bar 15 set in parallel thereto on an abrasive surface plate 11, the radius vector directional uneven form on the surface of an abrasive cloth 12 is measured. When this measurement is repeated about 6 times while rotating the abrasive surface plate 11 by about 30 deg., the unevenness on the whole abrasive cloth can be measured. The unevenness measuring instrument 14 and a conditioner 13 are moved so that the conditioner 13 reaches the position on the abrasive cloth 12 measured by the unevenness measuring instrument 14 after a fixed time. The load added to the conditioner 13 is set by transmitting a signal 19 from a control device 17 in proportional to the output 18 of the unevenness measuring instrument 14. Thus, the conditioning can be ended in a minimum time while keeping the flatness of the surface of the abrasive cloth 12.
申请公布号 JPH11170155(A) 申请公布日期 1999.06.29
申请号 JP19970338456 申请日期 1997.12.09
申请人 HITACHI LTD 发明人 KONDO SEIICHI;HONMA YOSHIO;KUSUKAWA KIKUO;NAGASAWA MASAYUKI
分类号 B24B53/017;H01L21/304 主分类号 B24B53/017
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