| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photoresist composition capable of imaging with rays of far ultraviolet wavelength and having improved stability or resistance to etching environment by including a resin composed of a specific polymer in combination with a photoactive component. SOLUTION: This composition is produced by including (A) a resin composed of a polymer containing (i) a group unstable to an acid containing isobornyl group and (ii) a group contributing to the water development of the obtained composition, preferably phenol group and (B) a photoactive component. Preferable example of the polymer is a polymer composed of a recurring unit of the formula [R is an (un)substituted isobornyl; Z is a crosslinking group between polymer units; R<1> is a halogen (especially F, Cl or Br), preferably a 1-12C (un) substituted alkyl, cyano, nitro or the like or two R<1> groups on the adjacent C atoms form a condensed aromatic ring or an aliphatic ring having 4 to about 8 ring members per one ring; (m) is 0-4; (x) and (y) are each molar fraction of each unit of the polymer]. |
