| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma treating device capable of forming a coating excellent in plane uniformity, small in pinholes and local defects and excellent in coating properties. SOLUTION: This plasma treating device is the one having a vessel 101 permitting evacuation, a gas supply means 107 for supplying a gas for exciting plasma into the vessel, an exhausting means 102 for exhausting the inside of the vessel and a microwave feeding means 111 feeding microwaves into the vessel and applying surface treatment to a body W to be treated. In this plasma treating device, as for the microwave feeding means, the face opposite to the body W to be treated is non-planar one with a shape corresponding to the face to be treated in the body to be treated. |
