发明名称 MANUFACTURE OF PHOTOSENSITIVE LITHOGRAPHIC PLATE AND PHOTOSENSITIVE LITHOGRAPHIC PLATE
摘要 PROBLEM TO BE SOLVED: To improve adhesion of a responsive layer to an aluminum plate surface by a method wherein the aluminum plate surface is roughened to execute anodizing treatment, then water washing is executed once, and further after execution of a surface moisture removing process and a cooling process wherein the atmosphere dew point is made to a specific temperature or under, the responsive layer is applied. SOLUTION: A roll oil on an aluminum plate surface is removed with a degreasing process using a solvent such as trichlene, thinner, etc., an emulsion degreasing treatment using an emulsion such as kerosene, triethanol, etc., or the like. Thereafter, the surface is roughened, and anodizing treated by d.c. electrolysis with sulfuric acid or phosphoric acid, or mixed aqueous solution of both. The, water washing or aqueous solution treatment is executed once. Thereafter, a surface moisture removing process with heating dry and a cooling process by making a dew point of an atmosphere to 10 deg.C or under are successively executed. Then, a responsive layer is applied. Thereby, adhesion of the responsive layer to the aluminum plate surface can be improved.
申请公布号 JPH11170722(A) 申请公布日期 1999.06.29
申请号 JP19970347706 申请日期 1997.12.17
申请人 KONICA CORP 发明人 MORI TAKAHIRO
分类号 G03F7/09;B41N3/03;G03F7/00;(IPC1-7):B41N3/03 主分类号 G03F7/09
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