发明名称 Optimized in-line mask cleaning system
摘要 A cleaning method and related apparatus for cleaning semiconductor screening masks using an aqueous alkali detergent solution applied under high pressure simultaneously from both sides of the mask, followed by a drying step that uses air knives to blow off the mask surface any residual cleaner solution.
申请公布号 US5916374(A) 申请公布日期 1999.06.29
申请号 US19980021046 申请日期 1998.02.09
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CASEY, JON A.;CROPP, MICHAEL E.;DIANGELO, DONALD W.;HARMUTH, JOHN F.;KNICKERBOCKER, JOHN U.;LONG, DAVID C.;MACKIN, DANIEL S.;POMERANTZ, GLENN A.;SACHDEV, KRISHNA G.;SPEED, DAVID E.;SULLIVAN, CANDACE A.;SULLIVAN, ROBERT J.;TRIPP, BRUCE E.;UTTER, JAMES C.
分类号 B08B3/02;B41F35/00;G03F1/00;G03F7/12;G03F7/42;H01L21/00;H05K3/12;H05K3/26;(IPC1-7):B08B3/04 主分类号 B08B3/02
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