| 摘要 |
Fabrication of support structures for use in field emitter displays through a photolithographic process that involves (1) depositing a photolithable material on a substrate, (2) etching the material to create column areas in the material, (3) filling the column areas with a support material, (4) planarizing the support material, photolithable material, and the filled column areas to the desired height, and (5) removing the remaining photolithable material by exposing the filled column areas as support structures on the substrate.
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