发明名称 |
Block exposure of semiconductor wafer |
摘要 |
A mask and a block exposure method for transferring a plurality of patterns of the same shape onto an exposure medium while forming the cross-sectional shape of a beam emitted from a light source into a desired pattern. The mask has at least one basic pattern formed by extracting portions of a common shape from pattern information to be exposed. A plurality of blocks are arranged on the mask. Each block includes a plurality of the basic patterns.
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申请公布号 |
US5917579(A) |
申请公布日期 |
1999.06.29 |
申请号 |
US19970893547 |
申请日期 |
1997.07.08 |
申请人 |
FUJITSU LIMITED |
发明人 |
MIYAJIMA, MASAAKI |
分类号 |
G03F1/16;G03F7/20;H01J37/302;H01L21/027;(IPC1-7):G03B27/42;H01J37/304 |
主分类号 |
G03F1/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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