发明名称 Method and apparatus for controlled particle deposition on surfaces
摘要 An atomizer has a chamber holding a liquid containing particles of a desired material. Aerosol particles are formed by using an aspirating nozzle or ultrasonic vibrator and the aerosol particles are carried in a gas flow. The aerosol particles are treated by increasing the charge on the aerosol particles by contact with a high voltage electrode and the aerosol particles are passed through inertial separator stages to remove large aerosol particles from the flow so they are not discharged from the atomizer.
申请公布号 US5916640(A) 申请公布日期 1999.06.29
申请号 US19960706664 申请日期 1996.09.06
申请人 MSP CORPORATION 发明人 LIU, BENJAMIN Y. H.;SUN, JAMES J.
分类号 B05D1/04;B05B1/26;B05B5/043;B05B7/00;B05B7/30;B05B17/06;H01L21/316;(IPC1-7):B05D1/04 主分类号 B05D1/04
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