发明名称 |
Method and apparatus for controlled particle deposition on surfaces |
摘要 |
An atomizer has a chamber holding a liquid containing particles of a desired material. Aerosol particles are formed by using an aspirating nozzle or ultrasonic vibrator and the aerosol particles are carried in a gas flow. The aerosol particles are treated by increasing the charge on the aerosol particles by contact with a high voltage electrode and the aerosol particles are passed through inertial separator stages to remove large aerosol particles from the flow so they are not discharged from the atomizer.
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申请公布号 |
US5916640(A) |
申请公布日期 |
1999.06.29 |
申请号 |
US19960706664 |
申请日期 |
1996.09.06 |
申请人 |
MSP CORPORATION |
发明人 |
LIU, BENJAMIN Y. H.;SUN, JAMES J. |
分类号 |
B05D1/04;B05B1/26;B05B5/043;B05B7/00;B05B7/30;B05B17/06;H01L21/316;(IPC1-7):B05D1/04 |
主分类号 |
B05D1/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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