| 摘要 |
A method for fabricating a liquid crystal display device comprising the steps of forming a patterning layer to be patterned on the a substrate; forming a protective layer on the patterning layer, the protective layer being provided to prevent the occurrence of a poor pattern; depositing a photoresist layer on the protective layer; patterning the photoresist layer to form a patterned photoresist layer; sequentially removing the protective layer and the patterning layer using the patterned photoresist layer as an etching mask; and removing the patterned photoresist layer. The method facilitates the formation of a smooth passivation layer surface since there is no step between the drain and pixel electrodes. As a result, constant brightness and high contrast can be obtained from a TFT-LCD device which is fabricated by the method of the present invention. A film having a low friction coefficient is also used as a protective layer to prevent the formation of a poor pattern, and thus a desired pattern can be obtained.
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